• DocumentCode
    1862645
  • Title

    The double-side electroplating and slender ferromagnetic patterns torque-enhancement design for magnetostatic actuator

  • Author

    Tang, Tsung-Lin ; Hsu, Chia-Pao ; Chen, Wen-Chien ; Fang, Weileun

  • Author_Institution
    Power Mech. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • fYear
    2009
  • fDate
    21-25 June 2009
  • Firstpage
    873
  • Lastpage
    876
  • Abstract
    This study demonstrates the torque-enhancement design for magnetostatic actuators driven by double-side electroplating ferromagnetic film. The present design has two merits: (1) the backside electroplating of the ferromagnetic film increases the magnetostatic torque, (2) the slender ferromagnetic material patterns with higher length-to-width ratio enhance the magnetostatic torque. The actuator is implemented on SOI wafer, and the process also has two merits, (1) the device-layer act as the cathode to enable simultaneous double-side electroplating, (2) the handle-layer is exploited as the shadow mask to pattern the seedlayer at backside wafer. In applications, a scanner were implemented and characterized. Measurements show a 149% torque enhancement from double-side electroplating design. The vertical slender ferromagnetic material patterns further increase the magnetostatic torque to 211%.
  • Keywords
    electromagnetic actuators; electroplating; ferromagnetic materials; silicon-on-insulator; torque; SOI wafer; double-side electroplating ferromagnetic film; length-to-width ratio; magnetostatic actuator; slender ferromagnetic material; slender ferromagnetic pattern torque-enhancement design; Coils; Electrostatic actuators; Energy consumption; Magnetic fields; Magnetic forces; Magnetic materials; Magnetostatics; Saturation magnetization; Soft magnetic materials; Torque; Actuator; double-side electroplating; magnetostatic force; slender pattern;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems Conference, 2009. TRANSDUCERS 2009. International
  • Conference_Location
    Denver, CO
  • Print_ISBN
    978-1-4244-4190-7
  • Electronic_ISBN
    978-1-4244-4193-8
  • Type

    conf

  • DOI
    10.1109/SENSOR.2009.5285842
  • Filename
    5285842