DocumentCode :
1862877
Title :
AlInN as high-index-contrast material for GaN-based optoelectronics
Author :
Carlin, J.-F. ; Dorsaz, J. ; Zellweger, C. ; Gradecak, S. ; Ilegems, M.
Author_Institution :
Inst. of Quantum Electron. & Photonics, Swiss Fed. Inst. of Technol., Lausanne, Switzerland
fYear :
2003
fDate :
25-27 Aug. 2003
Firstpage :
36
Lastpage :
41
Abstract :
High quality AlInN was grown near lattice-matched to GaN. It shows about 7% index contrast with GaN. AlInN is thus a promising alternative to AlGaN, as demonstrated by a 20-pairs AlInN/GaN distributed Bragg reflector with over 90% reflectivity. Light emitting diodes with active layers grown on top of AlInN/GaN multi-layers exhibit internal quantum efficiencies comparable to those of reference diodes grown directly on GaN buffer, this further demonstrate that AlInN material quality can meet the needs of optoelectronic application.
Keywords :
III-V semiconductors; aluminium compounds; distributed Bragg reflectors; gallium compounds; indium compounds; light emitting diodes; multilayers; reflectivity; semiconductor growth; wide band gap semiconductors; AlInN-GaN; AlInN-GaN multilayers; GaN buffer; GaN-based optoelectronics; distributed Bragg reflector; high-index-contrast material; internal quantum efficiencies; light emitting diodes; Buffer layers; Distributed Bragg reflectors; Fluid flow; Gallium nitride; Indium; Lattices; Light emitting diodes; Optical materials; Photonics; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Compound Semiconductors: Post-Conference Proceedings, 2003 International Symposium on
Print_ISBN :
0-7803-8614-0
Type :
conf
DOI :
10.1109/ISCSPC.2003.1354428
Filename :
1354428
Link To Document :
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