DocumentCode
1863104
Title
Success on elimination of pulse shortening of GW-class, 300 nsec HPM sources
Author
Hendricks, K. ; Haworth, M. ; Lemke, R. ; Sena, M. ; Ralph, D. ; Allen, K. ; Englert, T. ; Shiffler, D. ; Spencer, T. ; Arman, M. ; Hackett, K. ; Calico, S. ; Coleman, D. ; Clark, C. ; Gallagoes, R.
Author_Institution
Phillips Lab., Kirland AFB, NM, USA
fYear
1997
fDate
19-22 May 1997
Firstpage
190
Abstract
Summary form only given, as follows. We have demonstrated two different HPM sources which radiate rf power in excess of 1 GW: the MILO and RKO. The pulse lengths are limited only by the duration of the prime power. Both sources have been operated on the Sandia IMP pulser (500 kV, 5 /spl Omega/, 300 nsec) pulse power driver. While the physics of these sources are different, both have shown rf pulses shorter than the applied electron beam pulse. Following careful investigations both sources now generate rf pulse to the end of the electron beam pulse. This success has been achieved by closely comparing experimental performance and optimized computer simulation. Our results suggest that designing a long pulse HPM source and then being able to make the source operate as desired is usually limited by overlooking subtleties of the actual source operation. While it most certainly is true that stray plasma production may limit pulse length. Stray plasma production in these two sources is a symptom of design errors. We are preparing longer pulse experiments to investigate the next source of pulse shortening.
Keywords
insulation; microwave generation; microwave oscillators; microwave tubes; simulation; transmission lines; 1 GW; 500 kV; GW-class 300 nsec HPM sources; MILO; RF power; RKO; Sandia IMP pulser; computer simulation; electron beam pulse; high power microwave source; magnetically insulated transmission line oscillator; pulse lengths; pulse shortening; stray plasma production; Computer simulation; Electron beams; Laboratories; Microwave devices; Particle beams; Physics; Plasma simulation; Plasma sources; Production; Pulse generation;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location
San Diego, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3990-8
Type
conf
DOI
10.1109/PLASMA.1997.604780
Filename
604780
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