Title :
Self-Built Multilayer Aligner for Imprint with Finite Element Method Simulation
Author :
Cheng-Tang Pan ; Chi-Cheng Cheng ; Chin-Yin Chen
Keywords :
Application software; Displays; Finite element methods; Lithography; Nonhomogeneous media; Organic materials; Resists; Sputter etching; Sputtering; Thin film transistors;
Conference_Titel :
Advanced Intelligent Mechatronics. Proceedings, 2005 IEEE/ASME International Conference on
Print_ISBN :
0-7803-9047-4
DOI :
10.1109/AIM.2005.1500998