Progress toward a microsecond duration, repetitive, intense-ion beam accelerator

Author

Davis, A.K. ; Reass, William A. ; Coates, D.M. ; Schleinitz, H.M. ; Greenly, J.B. ; Lovberg, R.H.

Author_Institution

Los Alamos Nat. Lab., NM, USA

fYear

1997

fDate

19-22 May 1997

Firstpage

194

Abstract

Summary form only given. A number of intense ion beam applications are emerging requiring repetitive high-average-power beams. These applications include ablative deposition of thin films, rapid melt and resolidification for surface property enhancement, advanced diagnostic neutral beams for the next generation of Tokamaks, and intense pulsed-neutron sources. We are developing a 250 keV, 15 kA, 1/spl mu/s duration, 1-30 Hz intense-ion beam accelerator called CHAMP (continuous high average-power microsecond pulser). The accelerator will use a magnetically insulated extraction diode in ballistically focused geometry.

Keywords

electrostatic accelerators; ion accelerators; ion beam applications; ion sources; neutron sources; plasma diagnostics; plasma diodes; 1 mus; 1 to 30 Hz; 15 kA; 250 keV; CHAMP; Tokamaks; ablative deposition; advanced diagnostic neutral beams; ballistically focused geometry; continuous high average-power microsecond pulser; intense ion beam applications; intense pulsed-neutron sources; magnetically insulated extraction diode; rapid melt; repetitive high-average-power beams; repetitive intense-ion beam accelerator; resolidification; surface property enhancement; thin films; Acceleration; Anodes; Coils; Diodes; Ion accelerators; Magnetic fields; Particle beams; Plasma accelerators; Plasma sources; US Department of Energy;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on

Conference_Location

San Diego, CA, USA

ISSN

0730-9244

Print_ISBN

0-7803-3990-8

Type

conf

DOI

10.1109/PLASMA.1997.604800

Filename

604800