Title :
Effects of advanced dual anti-reflection layer coating on crystalline silicon solar cell efficiency
Author :
Chen, Chun-Wei ; Lin, Yan-Fu ; Lai, Chung-Wei ; Kuo, Cheng-Chang ; Ho, Shyuan-Jeng
Author_Institution :
AU Optronics Corp., Taichung, Taiwan
Abstract :
PECVD SiOx thin film combined with SiNx:H layer was used as dual anti-reflecting coating (DARC) to minimize surface reflectance. The advanced DARC enhanced cell efficiency of mono-crystalline and multi-crystalline Si solar cells by 0.15% and 0.31% with one more additional process. Short circuit current density (Jsc) of mono-crystalline and multi-crystalline was gained as 0.5 mA/cm2 and 0.6 mA/cm2 respectively. Efficiency improvement due to the blue response was confirmed by EQE measurements. Therefore, DARC process shows a good potential for higher cell efficiency for industrial crystalline Si cell production line.
Keywords :
antireflection coatings; current density; elemental semiconductors; plasma CVD; semiconductor thin films; silicon; solar cells; DARC process; EQE measurements; PECVD silicon oxide thin film; SiNx:H; SiOx; advanced DARC-enhanced cell efficiency; advanced dual-antireflection layer coating; blue response; efficiency 0.15 percent; efficiency 0.31 percent; industrial crystalline silicon cell production line; monocrystalline silicon solar cells; multicrystalline silicon solar cells; short-circuit current density; surface reflectance minimization; Coatings; Conferences; Photovoltaic cells; Photovoltaic systems; Reflectivity; Silicon;
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location :
Seattle, WA
Print_ISBN :
978-1-4244-9966-3
DOI :
10.1109/PVSC.2011.6186376
