DocumentCode
186761
Title
Self-heating effect in FinFETs and its impact on devices reliability characterization
Author
Liu, S.E. ; Wang, J.S. ; Lu, Y.R. ; Huang, D.S. ; Huang, C.F. ; Hsieh, W.H. ; Lee, J.H. ; Tsai, Y.S. ; Shih, J.R. ; Lee, Young-Hyun ; Wu, Kaijie
Author_Institution
TQRD, Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
fYear
2014
fDate
1-5 June 2014
Abstract
The impact of self-heating effect (SHE) on device reliability characterization, such as BTI, HCI, and TDDB, is extensively examined in this work. Self-heating effect and its impact on device level reliability mechanisms is carefully studied, and an empirical model for layout dependent SHE is established. Since the recovery effect during NBTI characterization is found sensitive to self-heating, either changing VT shift as index or adopting μs-delay measurement system is proposed to get rid of SHE influence. In common HCI stress condition, the high drain stress bias usually leads to high power or self-heating, which may dramatically under-estimate the lifetime extracted. The stress condition Vg = 0.6~0.8Vd is suggested to meet the reasonable operation power and self-heating induced temperature rising. Similarly, drain-bias dependent TDDB characteristics are also under-estimated due to the existence of SHE and need careful calibration to project the lifetime at common usage bias.
Keywords
MOSFET; semiconductor device reliability; μs-delay measurement system; FinFET; NBTI characterization; common HCI stress condition; common usage bias; device level reliability mechanisms; drain-bias dependent TDDB characteristics; empirical model; layout dependent SHE; self-heating effect; Degradation; FinFETs; Human computer interaction; Layout; Reliability; Stress; Temperature measurement; Finfet; reliability; self-heating;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 2014 IEEE International
Conference_Location
Waikoloa, HI
Type
conf
DOI
10.1109/IRPS.2014.6860642
Filename
6860642
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