High Resistance Open localization

Magnetic Field Imaging (MFI) is a widely used technique in the Semiconductor industry for non-destructive Electrical Fault Isolation (EFI) for shorts, leakages and opens. When the devices shrink and the mobile electronics industry has a more strict criteria for speed with low power consumption, making High Resistance Opens (HRO) failures more important to detect. We show in this paper two cases in which magnetic field phase analysis using MFI helped localize HRO failures that were causing delays and slower speed in addition to higher power consumption.