• DocumentCode
    1868252
  • Title

    The factors study of backside hotspot localization with application Infrared Lock-in Thermography

  • Author

    Hoe, T.M. ; Ng, K.K.

  • Author_Institution
    Infineon Technol. (Malaysia) Sdn. Bhd., Melaka, Malaysia
  • fYear
    2015
  • fDate
    June 29 2015-July 2 2015
  • Firstpage
    213
  • Lastpage
    218
  • Abstract
    The Infrared Lock-in Thermography (LIT), which is well establish technique for non-destructive evaluation, can be used to identify and locate thermal active electrically defects like shorts and resistive open in microelectronic devices. Most of the localization methods are performed directly on top of die surface. However, the Infrared Lock-In Thermograph (IR-LIT) is one of the localization methods can be performed with front side and backside localization. Basically the backside localization is to overcome the limitation of the front side hotspot localization especially low leakage current failure. To achieve better hotspot localization from the package backside, three important factors are studied; namely die thickness, build-in power setting for IR-LIT, as well as the pulse.
  • Keywords
    failure analysis; infrared imaging; integrated circuit testing; leakage currents; nondestructive testing; IR-LIT; backside hotspot localization; backside localization; build-in power setting; die surface; die thickness; front side localization; infrared lock-in thermography; leakage current failure; microelectronic devices; nondestructive evaluation; package backside; thermal active electrically defects; Cameras; Facsimile; Heating; Signal to noise ratio; Silicon; Thickness measurement; Time-frequency analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits (IPFA), 2015 IEEE 22nd International Symposium on the
  • Conference_Location
    Hsinchu
  • Type

    conf

  • DOI
    10.1109/IPFA.2015.7224374
  • Filename
    7224374