Title :
The factors study of backside hotspot localization with application Infrared Lock-in Thermography
Author :
Hoe, T.M. ; Ng, K.K.
Author_Institution :
Infineon Technol. (Malaysia) Sdn. Bhd., Melaka, Malaysia
fDate :
June 29 2015-July 2 2015
Abstract :
The Infrared Lock-in Thermography (LIT), which is well establish technique for non-destructive evaluation, can be used to identify and locate thermal active electrically defects like shorts and resistive open in microelectronic devices. Most of the localization methods are performed directly on top of die surface. However, the Infrared Lock-In Thermograph (IR-LIT) is one of the localization methods can be performed with front side and backside localization. Basically the backside localization is to overcome the limitation of the front side hotspot localization especially low leakage current failure. To achieve better hotspot localization from the package backside, three important factors are studied; namely die thickness, build-in power setting for IR-LIT, as well as the pulse.
Keywords :
failure analysis; infrared imaging; integrated circuit testing; leakage currents; nondestructive testing; IR-LIT; backside hotspot localization; backside localization; build-in power setting; die surface; die thickness; front side localization; infrared lock-in thermography; leakage current failure; microelectronic devices; nondestructive evaluation; package backside; thermal active electrically defects; Cameras; Facsimile; Heating; Signal to noise ratio; Silicon; Thickness measurement; Time-frequency analysis;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2015 IEEE 22nd International Symposium on the
Conference_Location :
Hsinchu
DOI :
10.1109/IPFA.2015.7224374