DocumentCode
1869622
Title
Development of microfluidic resonators via silicon-on-nothing technique
Author
Joohyun Kim ; Jungchul Lee
Author_Institution
Dept. of Mech. Eng., Sogang Univ., Seoul, South Korea
fYear
2015
fDate
18-22 Jan. 2015
Firstpage
184
Lastpage
187
Abstract
This paper reports wafer-level batch fabrication of microfluidic resonators by employing high temperature annealing of a pre-structured silicon wafer with periodic cylindrical pits for the first time. Upon high temperature annealing of pre-structured silicon, the surface silicon atoms around cylindrical pits moved and merged into long channel-shaped cavities with closed lids which are known as silicon-on-nothing (SON) structures [1]. Then, the wafer was planarized, cavities were oxidized, and resulting oxide microtubes were released to make free-standing resonators. Finally, metal reflectors were deposited for optical readout of resonance frequency. We have confirmed the functionality and integrity of the fabricated microtubes by injecting dyed solutions and measured resonance frequency of dry microtube resonators at various partial vacuums. The proposed fabrication processes are not only cost-effective but also potentially enable wafer-scale batch fabrication of nanofluidic resonators.
Keywords
annealing; elemental semiconductors; high-temperature techniques; microfabrication; microfluidics; micromechanical resonators; planarisation; silicon; SON structures; Si; cavity oxidation; dry microtube resonators; high temperature annealing; long channel-shaped cavity; metal reflectors; microfluidic resonators; nanofluidic resonators; optical readout; oxide microtubes; partial vacuums; periodic cylindrical pits; pre-structured silicon wafer; resonance frequency; silicon-on-nothing technique; surface silicon atoms; wafer planarization; wafer-level batch fabrication; Annealing; Cavity resonators; Fabrication; Microfluidics; Optical resonators; Silicon; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2015 28th IEEE International Conference on
Conference_Location
Estoril
Type
conf
DOI
10.1109/MEMSYS.2015.7050917
Filename
7050917
Link To Document