• DocumentCode
    1869943
  • Title

    Low loss polymer waveguides fabricated by plasma etching for nonlinear-optical devices operating at telecommunication wavelengths

  • Author

    Pliska, T. ; Ricci, V. ; Le Duff, A.-C. ; Canva, M. ; Raymond, P. ; Kajzar, F. ; Stegeman, G.I.

  • Author_Institution
    Sch. of Opt., Central Florida Univ., Orlando, FL, USA
  • fYear
    1999
  • fDate
    28-28 May 1999
  • Firstpage
    313
  • Lastpage
    314
  • Abstract
    Summary form only given. Organic materials exhibit large optical nonlinearities and, hence, are attractive for parametric interactions, cascading, and wavelength demultiplexing. In poled polymer waveguides figures of merit comparable to inorganic materials were obtained for second-harmonic generation (SHG) at 1.55 /spl mu/m. However, the absolute conversion efficiency was limited by the high loss of several tens of dB cm/sup -1/ at the second-harmonic wavelength. To reduce the loss of polymer waveguides used for second-order nonlinear effects at telecommunication wavelengths, materials with low intrinsic absorption between 0.6 and 1.6 /spl mu/m have to be combined with techniques allowing one to form waveguides with low scattering losses. Measurements are presented which show that with suitable materials, fabrication processes (plasma etching), and guide geometries it is possible to produce improved nonlinear polymer waveguides with sufficiently low losses for parametric mixing and cascading at 1.3 and 1.5 /spl mu/m.
  • Keywords
    optical fabrication; optical harmonic generation; optical planar waveguides; optical polymers; photolithography; spin coating; sputter etching; 1.3 micron; 1.5 micron; improved nonlinear polymer waveguides; low intrinsic absorption materials; low loss polymer waveguides; modal-dispersion phase-matched; nonlinear-optical devices; parametric mixing; photolithography; plasma etching; second-harmonic generation; spin coating; telecommunication wavelengths; Etching; Optical losses; Optical scattering; Optical waveguides; Organic materials; Plasma applications; Plasma materials processing; Plasma measurements; Plasma waves; Polymers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
  • Conference_Location
    Baltimore, MD, USA
  • Print_ISBN
    1-55752-595-1
  • Type

    conf

  • DOI
    10.1109/CLEO.1999.834241
  • Filename
    834241