DocumentCode
1870286
Title
Electroplated stencil reinforced with arch structures for printing fine and long conductive paste
Author
Pi-Hsun Chen ; Che-Hsin Lin
Author_Institution
Nat. Sun Yat-sen Univ., Kaohsiung, Taiwan
fYear
2015
fDate
18-22 Jan. 2015
Firstpage
272
Lastpage
275
Abstract
This study presents an MEMS-based stencil reinforced with arch structures and a surrounding buffer reservoir for printing conductive paste of fine and long lines. The developed reinforced stencil successfully solves the problems came with the conventional stencil structure including limited printable line width and ease of fracture. A novel process was developed to fabricate a thin yet robust electroplated stencil by using two AZ4620 layers and one SU-8 layer as the electroplating molds. A precise stencil with a long and high-density line structure can be produced with the developed method. The printing results show that the developed stencil is capable of printing parallel lines of 20 μm in pitch. The printable length of the fine parallel lines is longer than 10 mm with the arch structure reinforced stencil. In addition, the developed stencil is capable of printing closed ring patterns with small pitch, which is not possible to be printed using conventional stencil or screen printing technologies. The MEMS-based stencil developed in the present study will give substantial impact on the paste printing technologies.
Keywords
electroplating; micromechanical devices; AZ4620 layers; MEMS-based stencil; SU-8 layer; arch structures; buffer reservoir; closed ring patterns; conductive paste; ease of fracture; electroplated stencil; electroplating molds; limited printable line width; paste printing technologies; Fabrication; Nickel; Printing; Reservoirs; Substrates; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2015 28th IEEE International Conference on
Conference_Location
Estoril
Type
conf
DOI
10.1109/MEMSYS.2015.7050941
Filename
7050941
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