• DocumentCode
    1870307
  • Title

    Fabrication and characterization of single crystalline 4H-SiC MEMS devices with n-p-n homoepitaxial structure

  • Author

    Feng Zhao ; Lim, Allen V.

  • Author_Institution
    Dept. of Electr. Eng., Washington State Univ., Vancouver, WA, USA
  • fYear
    2015
  • fDate
    18-22 Jan. 2015
  • Firstpage
    276
  • Lastpage
    279
  • Abstract
    This paper reports single crystalline 4H-SiC MEMS with homoepitaxial n-p-n structure and its resonant characteristics under electrostatic actuation. Single crystalline fully exploits the superior material properties of SiC for operations in harsh environments. Compared to previously report p-n structure, the n-p-n structure makes electrostatic actuation applicable which is essentially important for applications of resonators and actuators to sensor devices. Such n-p-n structure, complementing the p-n structure, also further extends the capability of monolithic integration between SiC MEMS and electronic devices and circuits with not only p-n configurations such as diodes, but also n-p-n configurations such as BJTs and MOSFETs, etc.
  • Keywords
    electrostatic actuators; micromechanical devices; silicon compounds; wide band gap semiconductors; SiC; electrostatic actuation; n-p-n homoepitaxial structure; resonant characteristics; sensor devices; single crystalline 4H-SiC MEMS devices; Electrostatic actuators; Etching; Micromechanical devices; Microstructure; Silicon carbide; Substrates; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems (MEMS), 2015 28th IEEE International Conference on
  • Conference_Location
    Estoril
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2015.7050942
  • Filename
    7050942