DocumentCode
1870307
Title
Fabrication and characterization of single crystalline 4H-SiC MEMS devices with n-p-n homoepitaxial structure
Author
Feng Zhao ; Lim, Allen V.
Author_Institution
Dept. of Electr. Eng., Washington State Univ., Vancouver, WA, USA
fYear
2015
fDate
18-22 Jan. 2015
Firstpage
276
Lastpage
279
Abstract
This paper reports single crystalline 4H-SiC MEMS with homoepitaxial n-p-n structure and its resonant characteristics under electrostatic actuation. Single crystalline fully exploits the superior material properties of SiC for operations in harsh environments. Compared to previously report p-n structure, the n-p-n structure makes electrostatic actuation applicable which is essentially important for applications of resonators and actuators to sensor devices. Such n-p-n structure, complementing the p-n structure, also further extends the capability of monolithic integration between SiC MEMS and electronic devices and circuits with not only p-n configurations such as diodes, but also n-p-n configurations such as BJTs and MOSFETs, etc.
Keywords
electrostatic actuators; micromechanical devices; silicon compounds; wide band gap semiconductors; SiC; electrostatic actuation; n-p-n homoepitaxial structure; resonant characteristics; sensor devices; single crystalline 4H-SiC MEMS devices; Electrostatic actuators; Etching; Micromechanical devices; Microstructure; Silicon carbide; Substrates; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems (MEMS), 2015 28th IEEE International Conference on
Conference_Location
Estoril
Type
conf
DOI
10.1109/MEMSYS.2015.7050942
Filename
7050942
Link To Document