DocumentCode :
1870494
Title :
Analysis of current compliance on resistive switching of silver programmable metallization cells with stacked SiOx/SiO2 solid electrolytes
Author :
Jer-Chyi Wang ; Chun-Hsiang Chiu ; Ya-Ting Chan ; Chao-Sung Lai
Author_Institution :
Dept. of Electron. Eng., Chang Gung Univ., Taoyuan, Taiwan
fYear :
2015
fDate :
June 29 2015-July 2 2015
Firstpage :
548
Lastpage :
551
Abstract :
The influence of current compliance (ICC) on resistive switching (RS) of silver programmable metallization cells (Ag-PMCs) with stacked SiOx/SiO2 solid electrolytes has been investigated by carrier transportation and capacitance-voltage measurements. The low ICC of 10 μA leads to the superior multilevel RS characteristics because of a locally discontinuous conductive filament within the stacked solid electrolytes. Possible RS mechanisms of Ag-PMCs with different ICC are proposed according to the electrical analyses. Thus, the stacked-solid-electrolyte Ag-PMCs are considered as the promising candidate for future high-density nonvolatile memory application.
Keywords :
electrolytes; integrated circuit metallisation; programmable logic arrays; random-access storage; silicon compounds; silver; Ag; SiOx-SiO2; capacitance-voltage measurements; carrier transportation; current 10 muA; current compliance analysis; current compliance influence; nonvolatile memory; programmable metallization cells; resistive switching; solid electrolytes; Capacitance; Capacitance measurement; Capacitance-voltage characteristics; Resistance; Silver; Solids; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits (IPFA), 2015 IEEE 22nd International Symposium on the
Conference_Location :
Hsinchu
Type :
conf
DOI :
10.1109/IPFA.2015.7224455
Filename :
7224455
Link To Document :
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