Title :
Patent protection in Y2K-virtual or real
Author_Institution :
245 Park Ave., New York, NY, USA
Abstract :
Summary form only given, as follows. Many changes in the patent system and our approaches to it are occurring as we prepare for new technologies and rapid progress in the next millennium. Why this is happening and how to deal with it is explored at a basic level of understanding for both those with prior knowledge in this area as well as for neophytes as we learn from the past, wrestle with the present, and consider the future.
Keywords :
copy protection; copyright; optics; optoelectronic devices; patents; Y2K; basic level of understanding; future; learn; neophytes; new technologies; next millennium; past; patent protection; patent system; present; prior knowledge; real; virtual; Cathodes; Electrodes; Fault location; Plasma density; Plasma diagnostics; Plasma sources; Plasma x-ray sources; Protection; X-ray imaging; X-ray lasers;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-595-1
DOI :
10.1109/CLEO.1999.834285
