DocumentCode :
1871054
Title :
The application of ion beam implantation for synthetic diamond surface modification
Author :
Wei Pu
Author_Institution :
Southwestern Inst. of Phys., Sichuan, China
fYear :
1997
fDate :
19-22 May 1997
Firstpage :
212
Lastpage :
213
Abstract :
Summary form only given. The ion beam implantation for surface modification of synthetic diamond tools and natural diamond have been widely investigated in previous work. In this article, the ion beam implantation for surface modification of synthetic diamond powder at the Southwestern Institute of physics is described. The nitrogen ion and titanium ion with energies of 20-70 keV have been chosen as the implantation ions, the experiment performed in the multifunction implanter which was developed by ourself. The ion depth distribution and microstructure have been tested by XRD (X-ray diffraction). It shows that the implanted ions have a good chemical combination with the surface saturationless bond carbon atom.
Keywords :
X-ray diffraction; diamond; ion beam effects; ion implantation; plasma applications; surface treatment; 20 to 70 keV; C; N ion; Ti ion; X-ray diffraction; ion beam implantation; ion depth distribution; microstructure; multifunction implanter; synthetic diamond surface modification; Chemicals; Ion beams; Microstructure; Nitrogen; Physics; Powders; Testing; Titanium; X-ray diffraction; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3990-8
Type :
conf
DOI :
10.1109/PLASMA.1997.604893
Filename :
604893
Link To Document :
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