Research on application of ion implantation at SWIP

Summary form only given, as follows. In the last ten years, the research on application of ion implantation modification at SWIP in China has encompassed work in the areas of ion implantation equipment manufacture, material surface modification and its industrial applications including plasma source ion implantation (PSII) and ion beam ion implantation (IBII) technologies. Implantation equipment with the function of implantation and enhanced-deposition have been constructed. The MEVVA ion source for metal ion implantation and vacuum arc plasma source for metal plasma ion implantation and deposition have been employed successfully in IBII and PSII equipments respectively. Material surface modifications have been carried out in different modes. The modified workpieces have been tested in some industrial fields.