• DocumentCode
    1871489
  • Title

    End-to-end predictive modeling of silicon solar cell performance: From process recipe to device simulation

  • Author

    Trzynadlowski, Bart C. ; Jiang, Wenjun ; Chen, Renyu ; Dunham, Scott T.

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Washington, Seattle, WA, USA
  • fYear
    2011
  • fDate
    19-24 June 2011
  • Abstract
    We demonstrate the use of end-to-end predictive modeling to optimize silicon solar cell fabrication processes. Coupled continuum models for boron, phosphorus, iron, and oxygen are used to predict the distribution of electronically active defects. The models include point defect-mediated diffusion of boron and phosphorus from solid sources (e.g., POCl3) at both the emitter and back surface field. Interactions between iron and boron, boron and oxygen, and phosphorus and vacancies are modeled. From the resulting dopant and defect distributions, carrier lifetimes are computed and, along with the solar cell structure, are passed to a device simulation. We find a competing effect between lifetime-enhancing iron segregation to the boron-rich region and lifetime-degrading BO2 complex formation. Guided by modeling results, we suggest strategies to restore device performance in the presence of iron contamination and moderate oxygen concentrations, demonstrating the utility of an “end-to-end” modeling framework.
  • Keywords
    boron compounds; chlorine compounds; contamination; phosphorus compounds; solar cells; BO2; Fe; P; POCl3; Si; back surface field; boron; coupled continuum models; device simulation; dopant; electronically active defects distribution prediction; emitter; end-to-end modeling framework; end-to-end predictive modeling; iron contamination; lifetime-enhancing iron segregation; oxygen; oxygen concentrations; phosphorus; point defect-mediated diffusion; process recipe to device simulation; silicon solar cell fabrication processes; silicon solar cell performance; solar cell structure; solid sources; Boron; Charge carrier lifetime; Computational modeling; Iron; Performance evaluation; Semiconductor process modeling; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
  • Conference_Location
    Seattle, WA
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-9966-3
  • Type

    conf

  • DOI
    10.1109/PVSC.2011.6186565
  • Filename
    6186565