DocumentCode
1871933
Title
Large area cathode development for high rate deposition of amorphous and nano crystalline silicon
Author
Li, Yang ; Jones, Scott ; Kumar, Arun ; Cannella, Vin ; Yang, Jeffrey ; Guha, Subhendu
Author_Institution
United Solar Ovonic LLC, Troy, MI, USA
fYear
2011
fDate
19-24 June 2011
Abstract
United Solar Ovonic LLC. has developed a large area cathode for high rate plasma enhanced chemical vapor deposition (PECVD) using high frequency (HF, 10s to 100s MHz) which will enable us to build roll-to-roll (RTR) production systems for silicon based thin film solar cells.
Keywords
amorphous semiconductors; elemental semiconductors; plasma CVD; semiconductor thin films; silicon; solar cells; Si; amorphous silicon; high rate deposition; large area cathode development; nano crystalline silicon; plasma enhanced chemical vapor deposition; roll-to-roll production systems; silicon based thin film solar cells; Cathodes; Couplings; Electric fields; Films; Hafnium; Photovoltaic cells; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE
Conference_Location
Seattle, WA
ISSN
0160-8371
Print_ISBN
978-1-4244-9966-3
Type
conf
DOI
10.1109/PVSC.2011.6186584
Filename
6186584
Link To Document