Title :
Accurate characterization of SiO2 thin films using surface acoustic waves
Author :
Knapp, Matthias ; Lomonosov, Alexey M. ; Warkentin, Paul ; Jager, Philipp M. ; Ruile, Werner ; Kirschner, Hans-Peter ; Honal, Matthias ; Bleyl, Ingo ; Mayer, Andreas P. ; Reindl, Leonhard M.
Author_Institution :
a Group Co. of TDK Corp., EPCOS AG, Munich, Germany
Abstract :
We have investigated the acoustic properties of silicon dioxide thin films. Therefore, we determined the phase velocity dispersion of LiNbO3 substrate covered with SiO2 deposited by a plasma enhanced chemical vapor deposition and a physical vapor deposition (PVD) process using differential delay lines and laser ultrasonic method. The density p and the elastic constants (c11 and c44) can be extracted by fitting corresponding finite element simulations to the phase velocities within an accuracy of at least ±4%. Additionally, we propose two methods to improve the accuracy of the phase velocity determination by dealing with film thickness variation of the PVD process.
Keywords :
elastic constants; finite element analysis; plasma CVD; silicon compounds; surface acoustic wave delay lines; surface acoustic waves; thin films; ultrasonic dispersion; ultrasonic velocity; LiNbO3; PVD; SiO2; acoustic properties; density; differential delay line; elastic constants; film thickness variation; finite element simulations; laser ultrasonic method; phase velocity dispersion; physical vapor deposition; plasma enhanced chemical vapor deposition; silicon dioxide thin films; surface acoustic waves; Accuracy; Acoustics; Delay lines; Films; Phase measurement; Substrates; Velocity measurement;
Journal_Title :
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
DOI :
10.1109/TUFFC.2014.006921