Pulse repetition rate scaling of a small-scale (50 W) kinetically enhanced copper vapour laser (KE-CVL)

Author

Marshall, G.D. ; Coutts, David W.

Author_Institution

Clarendon Lab., Oxford Univ., UK

fYear

1999

fDate

28-28 May 1999

Firstpage

399

Lastpage

400

Abstract

Summary form only given. Kinetic enhancement of elemental copper vapour lasers by the addition of small partial pressures of hydrogen halides to the Ne:H/sub 2/ buffer gas has been reported by Withford et al. Such enhancement has been shown to dramatically increase the raw output power (up to 100% increase) and greatly improve the beam quality of elemental copper vapour lasers. To date this new class of Cu vapour lasers (KE-CVLs) have been operated only at pulse repetition rates up to 30 kHz. In this paper we report pulse repetition frequency (PRF) scaling of an efficient high power small-scale KE-CVL.

Keywords

copper; gas lasers; reaction kinetics; 50 W; Cu; Cu vapour lasers; Ne-He/sub 2/; Ne:H/sub 2/ buffer gas; efficient high power small-scale KE-CVL; elemental copper vapour lasers; hydrogen halides; kinetic enhancement; pulse repetition frequency scaling; pulse repetition rate scaling; pulse repetition rates; raw output power; small partial pressures; small-scale 50 W kinetically enhanced copper vapour laser; Copper; Frequency; Gas lasers; Hydrogen; Kinetic theory; Laser beams; Optical pulses; Power generation; Power lasers; Pulsed laser deposition;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on

Conference_Location

Baltimore, MD, USA

Print_ISBN

1-55752-595-1

Type

conf

DOI

10.1109/CLEO.1999.834360

Filename

834360