DocumentCode
1872702
Title
9th International Conference on Advanced Thermal Processing of Semiconductors. RTP 2001 (Cat. No.02EX513)
fYear
2001
fDate
25-29 Sept. 2001
Keywords
rapid thermal annealing; rapid thermal processing; semiconductor technology; temperature measurement; RTP; advanced oxide processing; annealing; illumination effects; rapid thermal processing; semiconductors; temperature measurement; thermal processing equipment;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Thermal Processing of Semiconductors 9th Internationa Conference on RTP 2001
Conference_Location
Anchorage, AK, USA
Print_ISBN
0-9638251-0-4
Type
conf
DOI
10.1109/RTP.2001.1013739
Filename
1013739
Link To Document