• DocumentCode
    1872863
  • Title

    A compact high-voltage pulse generator for plasma applications

  • Author

    Spassov, V.A. ; Barroso, J. ; Ueda, M. ; Gueorguiev, L.

  • Author_Institution
    Associated Plasma Lab., Nat. Inst. for Space Res., Sao Paulo, Brazil
  • fYear
    1997
  • fDate
    19-22 May 1997
  • Firstpage
    215
  • Abstract
    Summary form only given, as follows. The design and construction of a compact high voltage pulse generator for providing input electron beam power for the LAP/INPE 32 GHz gyrotron and for treatment of metal and polymer materials by plasma ion immersion implantation (PIII) are described. The generator was built on a circuit category of pulse forming network (PFN), consisting of nine LC sections with L=270 /spl mu/H and C=2.5 nF. The instrument was designed to produce a flat 30 kV, several Amps pulse in 15 /spl mu/s pulse length with pulse repetition frequency (PRF) of 8 to 100 Hz. By means of a resonant charging inductance it is possible to gain an output voltage with a factor of 1.8 higher than the voltage supplied by the pulse generator. The generator is fed with a sine-wave constant current source, and a 60 kV, 15 mA switching power supply.
  • Keywords
    gyrotrons; ion implantation; plasma applications; power supplies to apparatus; pulse generators; pulsed power switches; pulsed power technology; 15 mA; 15 mus; 30 kV; 35 GHz; 60 kV; 8 to 100 Hz; compact high-voltage pulse generator; construction; design; gyrotron; input electron beam power; metals; output voltage; plasma applications; plasma ion immersion implantation; polymer materials; pulse forming network; pulse generator; pulse length; pulse repetition frequency; resonant charging inductance; sine-wave constant current source; switching power supply; Building materials; Electron beams; Gyrotrons; Inorganic materials; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Polymers; Pulse generation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.604900
  • Filename
    604900