Title :
State-of-the art in vertical furnaces
Author :
Hasper, Albert ; Claasen-Vujcic, Tanja
Abstract :
Batch furnaces would be by now replaced by the single wafer technology, this subject has been around in every generation change. The actual situation is quite different: batch furnaces are still holding a large market share, they still offer most cost effective solutions, they are competitive, innovative and backed up by investments in new developments. This paper will cover a selection of latest developments in diffusion/LPCVD processing that have enabled this to happen.
Keywords :
chemical vapour deposition; diffusion; furnaces; LPCVD processing; batch furnace; diffusion processing; single wafer technology; vertical furnace; Boats; Costs; Furnaces; Hardware; Inductors; Metrology; Nitrogen; Subspace constraints; Temperature control; Throughput;
Conference_Titel :
Advanced Thermal Processing of Semiconductors 9th Internationa Conference on RTP 2001
Print_ISBN :
0-9638251-0-4
DOI :
10.1109/RTP.2001.1013747
