Temperature dependence of the reflectivity of silicon with surface oxide at wavelengths of 633 nm and 1047 nm

Summary form only given. The reflectivity change of materials due to phase changes or relatively large changes in temperature have been studied extensively in the literature. In such cases, the reflectivity variations are typically over 1%, which can be easily measured, and can actually be used for remote temperature sensing. Here, we show that such small reflectivity changes can be measured at high speed and over a temperature range of room temperature to about 200 degrees C, which corresponds to many industrial processes involving the thermal treatment of thin organic films.