DocumentCode :
1874846
Title :
A New Three-Dimensional Lithography Using Polymer Dispersed Liquid Crystal (PDLC) Films
Author :
Jeon, Jin-Wan ; Choi, Joon-Yong ; Yoon, Jun-Bo ; Lim, Koeng Su
Author_Institution :
Department of Electrical Engineering and Computer Science Korea Advanced Institute of Science and Technology (KAIST) 373-1 Guseong-dong, Yuseong-gu, Daejeon, Republic of Korea TEL:+82-42-869-8027, FAX:+82-42-869-8530, E-mail: didy@kaist.ac.kr
fYear :
2006
fDate :
2006
Firstpage :
110
Lastpage :
113
Abstract :
In this paper, we have proposed a new three-dimensional (3-D) lithography using polymer dispersed liquid crystal (PDLC) films. The scattering or transmission rate of ultraviolet (UV) rays through the PDLC film can be continuously controlled by varying the applied voltage across its electrodes. Various slopes and profiles of 3-D photoresist microstructures are easily and effectively fabricated by controlling applied voltages and biasing times of the PDLC film during one UV exposure step of the lithography process.
Keywords :
Lenses; Light scattering; Liquid crystal polymers; Lithography; Microoptics; Microstructure; Polymer films; Resists; Shape control; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2006. MEMS 2006 Istanbul. 19th IEEE International Conference on
Conference_Location :
Istanbul, Turkey
ISSN :
1084-6999
Print_ISBN :
0-7803-9475-5
Type :
conf
DOI :
10.1109/MEMSYS.2006.1627748
Filename :
1627748
Link To Document :
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