Title :
Diode-pumped fs-laser at 772 nm
Author :
Gabel, K.M. ; Lebert, R. ; Poprawe, Reinhart ; Valster, A.
Author_Institution :
Lehrstuhl fur Lasertech., Tech. Hochschule Aachen, Germany
Abstract :
Summary form only given. Diode-pumped fs-lasers have been demonstrated in the wavelength region above 810 nm. The 700 nm-800 nm wavelength range is even more important since fs-oscillators operating at 744 nm and 772 nm can be frequency multiplied to seed ultrafast UV-systems. The most common source to provide fs-pulses at matching fundamental wavelengths is still the expensive and bulky Ti:sapphire laser. We demonstrate the first diode-pumped laser providing sub-100 fs pulses at 4/spl lambda/ of ArF. The laser comprises a Brewster-cut Cr/sup 3+/:LiCAF crystal, which is pumped through the curved mirrors of an x-fold cavity by two 680 nm Philips laser diodes of 50 /spl mu/m stripe width.
Keywords :
aluminium compounds; calcium compounds; chromium; laser beams; laser cavity resonators; laser mirrors; lithium compounds; optical pulse generation; optical pumping; solid lasers; 700 to 800 nm; 744 nm; 772 nm; ArF; Cr/sup 3+/:LiCaAlF/sub 6/ crystal; LiCaAlF/sub 6/:Cr; Philips laser diodes; Ti:sapphire laser; curved mirrors; diode-pumped femtosecond lasers; diode-pumped laser; femtosecond pulses; femtosecond-oscillators; matching fundamental wavelengths; stripe width; sub-femtosecond pulses; ultrafast UV-systems; wavelength region; x-fold cavity; Diodes; Frequency; Laser mode locking; Laser tuning; Light scattering; Mirrors; Optical losses; Optical pulse generation; Optical scattering; Pump lasers;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-595-1
DOI :
10.1109/CLEO.1999.834457