DocumentCode :
1875412
Title :
Uniform Nanoliter Solute Deposition by the Control of Droplet Profile During Evaporation with Microwell
Author :
Chen, C.T. ; Tseng, F.G. ; Chieng, C.C.
Author_Institution :
Dept. of Engineering and System Science, National Tsing Hua University, Taiwan ROC
fYear :
2006
fDate :
2006
Firstpage :
190
Lastpage :
193
Abstract :
It is important but difficult to control the uniformity of solute deposition from a nanoliter droplet. The uniformity of solute deposition for a droplet in a nanoliter well is controlled by evaporation process. This paper proposes a method for uniform solute deposition from droplet evaporation confined by rib structures with specific surface properties, and the dynamic process is conducted experimentally and is analyzed in detail. Hydrophilic degree on the well surface is critical for controlling the film uniformity in the dynamic evaporation process, in particular around the rib of well. Experimental result indicates that the higher hydrophobicty (contact angle above 90°) on well surface yields flatter film profile during droplet evaporation inside a well, thus promotes a more uniform solute deposition.
Keywords :
Atmosphere; Atmospheric measurements; Ink; Optical films; Optical microscopy; Printing; Shape measurement; Solvents; Substrates; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 2006. MEMS 2006 Istanbul. 19th IEEE International Conference on
Conference_Location :
Istanbul, Turkey
ISSN :
1084-6999
Print_ISBN :
0-7803-9475-5
Type :
conf
DOI :
10.1109/MEMSYS.2006.1627768
Filename :
1627768
Link To Document :
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