DocumentCode
1875412
Title
Uniform Nanoliter Solute Deposition by the Control of Droplet Profile During Evaporation with Microwell
Author
Chen, C.T. ; Tseng, F.G. ; Chieng, C.C.
Author_Institution
Dept. of Engineering and System Science, National Tsing Hua University, Taiwan ROC
fYear
2006
fDate
2006
Firstpage
190
Lastpage
193
Abstract
It is important but difficult to control the uniformity of solute deposition from a nanoliter droplet. The uniformity of solute deposition for a droplet in a nanoliter well is controlled by evaporation process. This paper proposes a method for uniform solute deposition from droplet evaporation confined by rib structures with specific surface properties, and the dynamic process is conducted experimentally and is analyzed in detail. Hydrophilic degree on the well surface is critical for controlling the film uniformity in the dynamic evaporation process, in particular around the rib of well. Experimental result indicates that the higher hydrophobicty (contact angle above 90°) on well surface yields flatter film profile during droplet evaporation inside a well, thus promotes a more uniform solute deposition.
Keywords
Atmosphere; Atmospheric measurements; Ink; Optical films; Optical microscopy; Printing; Shape measurement; Solvents; Substrates; Surface morphology;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2006. MEMS 2006 Istanbul. 19th IEEE International Conference on
Conference_Location
Istanbul, Turkey
ISSN
1084-6999
Print_ISBN
0-7803-9475-5
Type
conf
DOI
10.1109/MEMSYS.2006.1627768
Filename
1627768
Link To Document