DocumentCode
1875475
Title
Improved fabrication process for III–V based optical interconnects on Silicon
Author
Spuesens, Thijs ; Regreny, P. ; Van Thourhout, Dries
Author_Institution
INTEC Dept., Photonics Res. Group, Ghent Univ. - Imec, Ghent, Belgium
fYear
2013
fDate
28-30 Aug. 2013
Firstpage
154
Lastpage
155
Abstract
We present a controllable bonding method and a self-aligned process for III-V based optical interconnects on Silicon. Optical interconnects are demonstrated with microdisk lasers with either ultra-low threshold current or record high slope efficiency.
Keywords
III-V semiconductors; elemental semiconductors; integrated optoelectronics; microdisc lasers; optical fabrication; optical interconnections; silicon; III-V based optical interconnects; Si; controllable bonding method; high slope efficiency; microdisk lasers; self-aligned process; ultralow threshold current; Bonding; Detectors; Lasers; Optical interconnections; Optical waveguides; Silicon; Waveguide lasers; heterogeneous integration; microdisk laser; optical interconnect; silicon-on-insulator;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2013 IEEE 10th International Conference on
Conference_Location
Seoul
ISSN
1949-2081
Print_ISBN
978-1-4673-5803-3
Type
conf
DOI
10.1109/Group4.2013.6644417
Filename
6644417
Link To Document