Title :
Refractive index change induced by quantum confined stark effect in Ge quantum wells
Author :
Frigerio, Jacopo ; Chaisakul, Papichaya ; Marris-Morini, D. ; Cecchi, S. ; Rouifed, M.-S. ; Isella, Giovanni ; Vivien, L.
Author_Institution :
Dipt. di Fis., Politec. di Milano, Como, Italy
Abstract :
Ge/SiGe multiple quantum well phase shifter in waveguide configuration is fabricated and characterized. A refractive index variation up to 1.3 × 10-3 is measured with an applied electric field of 88 kV/cm at 1475 nm.
Keywords :
Ge-Si alloys; elemental semiconductors; germanium; optical fabrication; optical phase shifters; optical waveguides; quantum confined Stark effect; refractive index; semiconductor quantum wells; Ge-SiGe; applied electric field; multiple quantum well phase shifter; quantum confined Stark effect; refractive index change; waveguide configuration; wavelength 1475 nm; Electric fields; Indexes; Optical waveguides; Phase shifters; Quantum well devices; Refractive index; Silicon germanium;
Conference_Titel :
Group IV Photonics (GFP), 2013 IEEE 10th International Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4673-5803-3
DOI :
10.1109/Group4.2013.6644429
