DocumentCode :
1876121
Title :
Field emission energy distributions from silicon field emitters
Author :
Shimawaki, Hidetaka ; Suzuki, Yousuke ; Sagae, Katsumi ; Neo, Yoichiro ; Mimura, Hidenori
Author_Institution :
Dept. of Syst. & Inf. Eng., Hachinohe Inst. of Technol., Japan
fYear :
2004
fDate :
11-16 July 2004
Firstpage :
234
Lastpage :
235
Abstract :
The energy distribution of field-emitted electrons from single-tip n-type and p-type silicon field emitters has been analyzed. The energy distribution becomes broader and the peak position shifts to lower energy, as the gate voltage is increased. All distributions measured from an n-type single-tip silicon field emitter at several gate voltages have threshold energies at the Fermi level, EF, on the other, the threshold energies from a p-type single-tip silicon field emitter are shifted to lower with the same distribution shape with increasing the gate voltage. These characteristics suggest that the field emission of silicon emitters involves electrons from interface states.
Keywords :
Fermi level; electron field emission; elemental semiconductors; interface states; semiconductor devices; silicon; Fermi level; Si; field emission energy distributions; field-emitted electrons; gate voltage; interface states; peak position; silicon field emitters; single-tip n-type silicon field emitter; single-tip p-type silicon field emitter; threshold energies; Electron emission; Electrostatic analysis; Electrostatic measurements; Energy measurement; Interface states; Pressure measurement; Rotation measurement; Shape measurement; Silicon; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN :
0-7803-8397-4
Type :
conf
DOI :
10.1109/IVNC.2004.1354991
Filename :
1354991
Link To Document :
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