• DocumentCode
    1876121
  • Title

    Field emission energy distributions from silicon field emitters

  • Author

    Shimawaki, Hidetaka ; Suzuki, Yousuke ; Sagae, Katsumi ; Neo, Yoichiro ; Mimura, Hidenori

  • Author_Institution
    Dept. of Syst. & Inf. Eng., Hachinohe Inst. of Technol., Japan
  • fYear
    2004
  • fDate
    11-16 July 2004
  • Firstpage
    234
  • Lastpage
    235
  • Abstract
    The energy distribution of field-emitted electrons from single-tip n-type and p-type silicon field emitters has been analyzed. The energy distribution becomes broader and the peak position shifts to lower energy, as the gate voltage is increased. All distributions measured from an n-type single-tip silicon field emitter at several gate voltages have threshold energies at the Fermi level, EF, on the other, the threshold energies from a p-type single-tip silicon field emitter are shifted to lower with the same distribution shape with increasing the gate voltage. These characteristics suggest that the field emission of silicon emitters involves electrons from interface states.
  • Keywords
    Fermi level; electron field emission; elemental semiconductors; interface states; semiconductor devices; silicon; Fermi level; Si; field emission energy distributions; field-emitted electrons; gate voltage; interface states; peak position; silicon field emitters; single-tip n-type silicon field emitter; single-tip p-type silicon field emitter; threshold energies; Electron emission; Electrostatic analysis; Electrostatic measurements; Energy measurement; Interface states; Pressure measurement; Rotation measurement; Shape measurement; Silicon; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
  • Print_ISBN
    0-7803-8397-4
  • Type

    conf

  • DOI
    10.1109/IVNC.2004.1354991
  • Filename
    1354991