DocumentCode
1876121
Title
Field emission energy distributions from silicon field emitters
Author
Shimawaki, Hidetaka ; Suzuki, Yousuke ; Sagae, Katsumi ; Neo, Yoichiro ; Mimura, Hidenori
Author_Institution
Dept. of Syst. & Inf. Eng., Hachinohe Inst. of Technol., Japan
fYear
2004
fDate
11-16 July 2004
Firstpage
234
Lastpage
235
Abstract
The energy distribution of field-emitted electrons from single-tip n-type and p-type silicon field emitters has been analyzed. The energy distribution becomes broader and the peak position shifts to lower energy, as the gate voltage is increased. All distributions measured from an n-type single-tip silicon field emitter at several gate voltages have threshold energies at the Fermi level, EF, on the other, the threshold energies from a p-type single-tip silicon field emitter are shifted to lower with the same distribution shape with increasing the gate voltage. These characteristics suggest that the field emission of silicon emitters involves electrons from interface states.
Keywords
Fermi level; electron field emission; elemental semiconductors; interface states; semiconductor devices; silicon; Fermi level; Si; field emission energy distributions; field-emitted electrons; gate voltage; interface states; peak position; silicon field emitters; single-tip n-type silicon field emitter; single-tip p-type silicon field emitter; threshold energies; Electron emission; Electrostatic analysis; Electrostatic measurements; Energy measurement; Interface states; Pressure measurement; Rotation measurement; Shape measurement; Silicon; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN
0-7803-8397-4
Type
conf
DOI
10.1109/IVNC.2004.1354991
Filename
1354991
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