DocumentCode
1876196
Title
Observation of electron emission pattern from nano-split emitter fabricated using beam assisted process
Author
Murakami, K. ; Yamasaki, N. ; Abo, S. ; Wakaya, E. ; Takai, M.
Author_Institution
Res. Center for Mater. Sci. at Extreme Conditions, Osaka Univ., Japan
fYear
2004
fDate
11-16 July 2004
Firstpage
240
Lastpage
241
Abstract
The possibility of interference of electrons from a nano-split emitter fabricated using beam assisted processes has been investigated. With the gap size of 16 nm, the emission pattern with two spots was observed at a gate voltage close to the turn-on voltage. At the higher gate voltages, two spots become overlapped but no interference fringes were observed at room temperature.
Keywords
electron field emission; nanostructured materials; platinum; 16 nm; Pt; beam assisted process; electron emission pattern; electron interference; gap size; gate voltage; interference fringes; nanosplit emitter; turn-on voltage; Electrodes; Electromagnetic interference; Electron beams; Electron emission; Gold; Materials science and technology; Phosphors; Temperature measurement; Visualization; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN
0-7803-8397-4
Type
conf
DOI
10.1109/IVNC.2004.1354994
Filename
1354994
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