Direct Etch Method for Microfluidic Channel and Nano-Height Post Fabrication by Picoliter Droplets

Photolithography is an expensive and significant step in microfabrication. Approaches that could change lithography could create impact on semiconductor and microelectromechanical systems fields. We demonstrate a droplet based direct etching method by ejecting etchant droplets at desired locations by using microdroplet ejector arrays. This method could be used for easy fabrication of poly(dimethylsiloxane) microfluidic channels; nanometer height post-like structures in microfluidic channels.