Rapid Fabrication Process for High Aspect-Ratio Embedded Microchannels with Orifices Usinga Single SU-8 Layer Onamask

In this paper, a novel single-mask fabrication method for high aspect-ratio embedded microchannels and high-density arrayed micro-orifices is presented. The proposed process is based on inclined UV lithography to expose a single layered photoresist coated on a patterned mask. Long embedded microchannels with a length/width ratio as high as 1000 can be fabricated by the proposed process. By a suction test with HeLa-GFP cells, it was experimentally confirmed that the fabricated devices are applicable for single-cell analysis.