Novel Photolithography to Perform the Oblique Microstructure

A novel photolithography method of creating an oblique microstructure with the required demolding angle for microforming application was proposed. The concept of this novel photolithography method is based on the traditional geometrical optics plus micro lens. In the stage of photolithography, the exposure light could be locally adjusted by the micro lens inserted into the exposure light path. As a result, an oblique photoresist microstructure with 7 to 14 degree angle could be accomplished.