Title :
Electron emission from boron nitride films deposited on patterned substrates
Author :
Shima, Hidekazu ; Funakawa, Shingo ; Kimura, Chiharu ; Sugino, Takashi
Author_Institution :
Dept. of Electr. Eng., Osaka Univ., Japan
Abstract :
In this paper field emission characteristics are investigated for the BN nanofilm deposited on the patterned substrate which leads to an increase of the field enhancement factor. A reduction in the threshold electric field and an increase of the emission site are demonstrated. Uniformity of the electron emission is significantly improved.
Keywords :
III-V semiconductors; boron compounds; electron field emission; nanostructured materials; semiconductor thin films; BN; electron emission; emission site; field enhancement factor; nanofilm; patterned substrates; threshold electric field; Anodes; Boron; Cathodes; Electrodes; Electron emission; Etching; Gallium arsenide; Lithography; Plasma temperature; Substrates;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2004. IVNC 2004. Technical Digest of the 17th International
Print_ISBN :
0-7803-8397-4
DOI :
10.1109/IVNC.2004.1355009
