Title :
Ultrafast laser deposition with mode locked and Q-switched Nd:YAG lasers
Author :
Rode, A.V. ; Luther-Davies, Barry ; Gamaly, E.G.
Author_Institution :
Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT, Australia
Abstract :
Summary form only given. Ultrafast pulsed laser deposition is a novel technique for depositing particle-free, thin solid films using very high repetition rate lasers. The process involves evaporation of the target by low energy laser pulses focused to an optimum intensity to eliminate particles from the vapour. This results in films with very high surface quality whilst the very high repetition rate increases the overall deposition rate. We report an experimental demonstration of the process by creating ultrasmooth, thin, amorphous carbon films using high repetition rate Nd:YAG lasers. Both a 10 kHz, 120 ns Q-switched Nd:YAG laser, or a 76 MHz 60 ps mode-locked Nd:YAG laser were used in the experiments.
Keywords :
Q-switching; amorphous semiconductors; carbon; elemental semiconductors; high-speed optical techniques; laser mode locking; neodymium; pulsed laser deposition; semiconductor thin films; solid lasers; 10 kHz; 120 ns; 60 ps; 76 MHz; C; Nd:YAG lasers; Q-switched lasers; YAG:Nd; YAl5O12:Nd; deposition rate; evaporation; high repetition rate; high repetition rate lasers; low energy laser pulses; mode locked lasers; optimum intensity; particle elimination; particle-free deposition; particle-free thin solid films; ultrafast laser deposition; ultrafast pulsed laser deposition; ultrasmooth thin amorphous C films; Fiber lasers; Laser beams; Laser mode locking; Laser theory; Optical fibers; Optical scattering; Particle beams; Pulsed laser deposition; Solid lasers; Substrates;
Conference_Titel :
Lasers and Electro-Optics, 1999. CLEO '99. Summaries of Papers Presented at the Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-595-1
DOI :
10.1109/CLEO.1999.834525
