Title :
Interleaved angled MMI CWDM structure on the SOI platform
Author :
Hu, Ya ; Gardes, Frederic Y. ; Thomson, David J. ; Mashanovich, Goran Z. ; Reed, Graham T.
Author_Institution :
Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK
Abstract :
We have demonstrated a low-insertion-loss 8-channel interleaved angled MMI CWDM structure on the SOI platform. It requires only a single-step lithography and etching for fabrication and has good tolerance to fabrication errors.
Keywords :
etching; integrated optoelectronics; multiplexing equipment; optical communication equipment; optical fabrication; optical losses; photolithography; silicon-on-insulator; wavelength division multiplexing; SOI platform; Si; coarse wavelength division multiplexer; etching; fabrication errors; fabrication tolerance; lithography; low-insertion-loss 8-channel interleaved angled MMI CWDM structure; Arrayed waveguide gratings; Channel spacing; Etching; Fabrication; Insertion loss; Lithography; Sensitivity;
Conference_Titel :
Group IV Photonics (GFP), 2013 IEEE 10th International Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4673-5803-3
DOI :
10.1109/Group4.2013.6644470
