• DocumentCode
    1877013
  • Title

    Interleaved angled MMI CWDM structure on the SOI platform

  • Author

    Hu, Ya ; Gardes, Frederic Y. ; Thomson, David J. ; Mashanovich, Goran Z. ; Reed, Graham T.

  • Author_Institution
    Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK
  • fYear
    2013
  • fDate
    28-30 Aug. 2013
  • Firstpage
    21
  • Lastpage
    22
  • Abstract
    We have demonstrated a low-insertion-loss 8-channel interleaved angled MMI CWDM structure on the SOI platform. It requires only a single-step lithography and etching for fabrication and has good tolerance to fabrication errors.
  • Keywords
    etching; integrated optoelectronics; multiplexing equipment; optical communication equipment; optical fabrication; optical losses; photolithography; silicon-on-insulator; wavelength division multiplexing; SOI platform; Si; coarse wavelength division multiplexer; etching; fabrication errors; fabrication tolerance; lithography; low-insertion-loss 8-channel interleaved angled MMI CWDM structure; Arrayed waveguide gratings; Channel spacing; Etching; Fabrication; Insertion loss; Lithography; Sensitivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics (GFP), 2013 IEEE 10th International Conference on
  • Conference_Location
    Seoul
  • ISSN
    1949-2081
  • Print_ISBN
    978-1-4673-5803-3
  • Type

    conf

  • DOI
    10.1109/Group4.2013.6644470
  • Filename
    6644470
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1877013