Title :
Effect of mask grid on SOI arrayed waveguide grating performance
Author :
Pathak, Sant ; Vanslembrouck, Michael ; Dumon, P. ; Van Thourhout, Dries ; Bogaerts, W.
Author_Institution :
Photonics Res. Group (INTEC), Ghent Univ. - imec, Ghent, Belgium
Abstract :
We studied the impact of the lithography mask grid on the performance of silicon AWGs, and show a dramatic improvement in crosstalk of 5dB when going from a 5nm to a 1nm grid.
Keywords :
elemental semiconductors; integrated optics; integrated optoelectronics; lithography; optical crosstalk; optical fabrication; optical waveguides; silicon-on-insulator; AWG; SOI arrayed waveguide grating performance; Si; crosstalk; lithography mask grid; silicon-on-insulator; Adaptive optics; Arrayed waveguide gratings; Crosstalk; Delay lines; Multiplexing; Silicon;
Conference_Titel :
Group IV Photonics (GFP), 2013 IEEE 10th International Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4673-5803-3
DOI :
10.1109/Group4.2013.6644475
