Title :
Broadband antireflection nanodome structures on SiC substrate
Author :
Yiyu Ou ; Xiaolong Zhu ; Moller, Uffe ; Sanshui Xiao ; Haiyan Ou
Author_Institution :
DTU Fotonik, Tech. Univ. of Denmark, Lyngby, Denmark
Abstract :
Nanodome structures are demonstrated on the SiC substrate by using nanosphere lithography and dry etching. Significant surface antireflection has been observed over a broad spectral range from 400 nm to 1600 nm.
Keywords :
antireflection coatings; etching; nanolithography; nanophotonics; SiC; SiC substrate; broadband antireflection nanodome structures; dry etching; nanosphere lithography; surface antireflection; wavelength 400 nm to 1600 nm; Arrays; Broadband communication; Etching; Nanostructures; Reflectivity; Silicon carbide; Nanofabrication; sub-wavelength material; surface antireflection;
Conference_Titel :
Group IV Photonics (GFP), 2013 IEEE 10th International Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4673-5803-3
DOI :
10.1109/Group4.2013.6644482
