DocumentCode
1877437
Title
Ion sources for use in research and applied high voltage accelerators
Author
Nikiforov, S. ; Golubev, V. ; Solnyshkov, D. ; Svinin, M. ; Voronin, G.
Author_Institution
Efremov (D.V.) Sci. Res. Inst. of Electrophys. Apparatus, St. Petersburg, Russia
Volume
2
fYear
1995
fDate
1-5 May 1995
Firstpage
1004
Abstract
Brief description of design and performance of some ion sources, developed at the Efremov Institute for use in different types of accelerators, is given. They are several modifications of duoplasmatron ion source including H-version; RF-, Penning, Freeman and ECR ion sources for positive ion and cesium sputter source for negative ion production. Extracted current range spans 10-4-10+2 mA
Keywords
Penning ion sources; duoplasmatrons; ion sources; cesium sputter source; duoplasmatron ion source; high voltage accelerators; ion sources; negative ion production; positive ion sources; Acceleration; Anodes; Cathodes; Electrodes; Fault location; Ion accelerators; Ion sources; Particle beams; Structural beams; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 1995., Proceedings of the 1995
Conference_Location
Dallas, TX
Print_ISBN
0-7803-2934-1
Type
conf
DOI
10.1109/PAC.1995.505110
Filename
505110
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