Title :
Integration of millisecond and spike anneals for dopant activation optimization
Author :
Shiyu Sun ; Sharma, Shantanu ; Rao, K.V. ; Ng, Bryan ; Kouzminov, D. ; Colombeau, B. ; Variam, N. ; Muthukrishnan, S. ; Mayur, A. ; Brand, A.
Author_Institution :
SSG CTO Office, Appl. Mater. Inc., Sunnyvale, CA, USA
Abstract :
The effects of anneal sequences (ms anneal followed by spike anneal vs. spike anneal followed by ms anneal) were explored. Substantial anneal sequence effects on dopant activation were also reported.
Keywords :
annealing; doping profiles; optimisation; secondary ion mass spectra; SIMS; dopant activation optimization; millisecond anneal; spike anneal; substantial anneal sequence effects; Annealing; Conferences; Implants; Junctions; Silicon; Temperature measurement;
Conference_Titel :
Junction Technology (IWJT), 2013 13th International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
978-1-4799-0578-2
DOI :
10.1109/IWJT.2013.6644512
