DocumentCode :
1878286
Title :
Progress and prospects of silicon transistors based on junction technologies
Author :
Wakabayashi, H.
Author_Institution :
Tokyo Inst. of Technol., Yokohama, Japan
fYear :
2013
fDate :
6-7 June 2013
Firstpage :
98
Lastpage :
103
Abstract :
Progress of silicon transistors will be described on junction technologies. Especially, advanced CMOS device and more than Moore technologies will be discussed for various applications.
Keywords :
CMOS integrated circuits; MOSFET; elemental semiconductors; silicon; CMOS device; Moore technologies; Si; junction technologies; silicon transistors; CMOS integrated circuits; Field effect transistors; Junctions; Logic gates; Silicon; Very large scale integration; Advanced CMOS device; Communication device; Display device; Image sensor; Junction technologies; More-than-Moore device; Non-volatile memory; Packaging technology; Scaling; Silicon Transistor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Junction Technology (IWJT), 2013 13th International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
978-1-4799-0578-2
Type :
conf
DOI :
10.1109/IWJT.2013.6644515
Filename :
6644515
Link To Document :
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