Title :
Ultra small InAs/GaInP/InP quantum dots [MOMBE growth]
Author :
Raz, T. ; Ritter, D. ; Bahir, G. ; Gershoni, D.
Author_Institution :
Dept. of Electr. Eng., Technion-Israel Inst. of Technol., Haifa, Israel
Abstract :
InAs quantum dots were grown on tensile strained GaxIn1-xP layers having a Ga content between x=0 to x=0.3, on InP substrates. The vertical dimension of these quantum dots is demonstrated to be just 2 to 8 monolayers. The PL emission is composed of distinct peaks, each peak attributed to quantum dots having the same height. The size distribution of the quantum dots depends on their growth time, as well as on the Ga content in the strained GaxIn1-xP layer underneath. A comparison between an 8 band k·P model and the measured energy levels, reveals that Ga atoms diffused from the GaxIn1-xP layer into the quantum dots. The Ga concentration in the quantum dots reached 19%, for dots grown on Ga0.3In0.7P.
Keywords :
chemical beam epitaxial growth; gallium compounds; indium compounds; photoluminescence; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum dots; InAs-GaInP-InP; InAs/GaInP/InP; MOMBE; PL emission; energy levels; growth time; k·P model; quantum dots; size distribution; vertical dimension; Atomic force microscopy; Atomic layer deposition; Atomic measurements; Capacitive sensors; Cities and towns; Force measurement; Indium phosphide; Lattices; Quantum dots; US Department of Transportation;
Conference_Titel :
Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th
Print_ISBN :
0-7803-7320-0
DOI :
10.1109/ICIPRM.2002.1014105