Title :
Design considerations for a test structure which can be used to determine the optimum focus
Author :
Walton, A.J. ; Fallon, M. ; Stevenson, J.T.M. ; Ross, A.W.S.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
Abstract :
A test structure which can be used to optimize the focus of wafer steppers is described. Simulation is used to determine the optimum setting for some of the design parameters in order to ensure maximum sensitivity of the device. Preliminary results indicate that the resistance of the structure is sensitive to changes in both exposure and focus, but that the `noise´ on the measurement masks the true sensitivity
Keywords :
focusing; integrated circuit technology; integrated circuit testing; design parameters; exposure; focus; maximum sensitivity; optimum focus; optimum setting; test structure; wafer steppers; Bars; Electric resistance; Electric variables measurement; Electrical resistance measurement; Focusing; Optical modulation; Position measurement; Size measurement; Testing; Time measurement;
Conference_Titel :
Microelectronic Test Structures, 1993. ICMTS 1993. Proceedings of the 1993 International Conference on
Conference_Location :
Sitges
Print_ISBN :
0-7803-0857-3
DOI :
10.1109/ICMTS.1993.292907
