• DocumentCode
    1881907
  • Title

    Design considerations for a test structure which can be used to determine the optimum focus

  • Author

    Walton, A.J. ; Fallon, M. ; Stevenson, J.T.M. ; Ross, A.W.S.

  • Author_Institution
    Dept. of Electr. Eng., Edinburgh Univ., UK
  • fYear
    1993
  • fDate
    22-25 Mar 1993
  • Firstpage
    275
  • Lastpage
    280
  • Abstract
    A test structure which can be used to optimize the focus of wafer steppers is described. Simulation is used to determine the optimum setting for some of the design parameters in order to ensure maximum sensitivity of the device. Preliminary results indicate that the resistance of the structure is sensitive to changes in both exposure and focus, but that the `noise´ on the measurement masks the true sensitivity
  • Keywords
    focusing; integrated circuit technology; integrated circuit testing; design parameters; exposure; focus; maximum sensitivity; optimum focus; optimum setting; test structure; wafer steppers; Bars; Electric resistance; Electric variables measurement; Electrical resistance measurement; Focusing; Optical modulation; Position measurement; Size measurement; Testing; Time measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1993. ICMTS 1993. Proceedings of the 1993 International Conference on
  • Conference_Location
    Sitges
  • Print_ISBN
    0-7803-0857-3
  • Type

    conf

  • DOI
    10.1109/ICMTS.1993.292907
  • Filename
    292907