DocumentCode
1883283
Title
High voltage silicon carbide Junction Barrier Schottky rectifiers
Author
Zetterling, Carl-Mikael ; Dahlquist, Fanny ; Lundberg, Nils ; Östling, Mikael ; Rottner, Kurt ; Ramberg
Author_Institution
Dept. of Electron., R. Inst. of Technol., Stockholm, Sweden
fYear
1997
fDate
4-6 Aug 1997
Firstpage
256
Lastpage
262
Abstract
The Junction Barrier Schottky (JBS) diode has the advantage of a low forward voltage drop comparable to that of Schottky diodes, as well as a high blocking voltage and low reverse leakage current of a pn diode. This device, originally demonstrated in silicon technology, is especially attractive for wide bandgap materials such as silicon carbide (SiC) in which pn diodes have a large forward voltage drop. Two different JBS designs in 6H SiC have been fabricated, and the electrical characteristics have been compared to Schottky and pn diodes on the same wafer. Although the ion implanted pn diodes had remaining implant damage, the JBS diodes worked well. The JBS diodes were capable of blocking up to 1100 V with a leakage current density of 0.15 A/cm2 , limited by the leakage when the drift region was fully depleted, or breakdown of the SiC material itself. The forward conduction was limited by an on-resistance of 20 mΩ cm2
Keywords
Schottky diodes; ion implantation; power semiconductor diodes; silicon compounds; solid-state rectifiers; wide band gap semiconductors; 1100 V; 6H-SiC; JBS diode; SiC; blocking voltage; electrical characteristics; forward voltage drop; high voltage Junction Barrier Schottky rectifier; ion implantation; pn diode; reverse leakage current density; silicon carbide; wide bandgap material; Schottky diodes;
fLanguage
English
Publisher
ieee
Conference_Titel
High Speed Semiconductor Devices and Circuits, 1997. Proceedings., 1997 IEEE/Cornell Conference on Advanced Concepts in
Conference_Location
Ithaca, NY
ISSN
1079-4700
Print_ISBN
0-7803-3970-3
Type
conf
DOI
10.1109/CORNEL.1997.649365
Filename
649365
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