DocumentCode :
1884381
Title :
Effects of electrostatic charge accumulation during MEMS fabrication
Author :
Antoniu, Angela ; Salomons, Mark ; Reus, Nicolae
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Alberta, Edmonton, Alta., Canada
fYear :
2003
fDate :
20-23 July 2003
Firstpage :
69
Lastpage :
75
Abstract :
Electrostatic charge transfer during the MEMS fabrication processes poses problems when the charge accumulates on the MEMS device. This can cause both particle attraction to the charged micro-system or its components as well as malfunctions. An example of the effects of such phenomena is presented for the case of an electrostatic comb drive, where parts of the device are contaminated through electrostatic attraction (ESA). The results of the electrostatic field measurements performed during one fabrication process in MEMS devices are shown and a solution for overcoming the ESA effects is proposed.
Keywords :
charge measurement; elemental semiconductors; micromechanical devices; silicon; surface charging; MEMS; Si; charged micro system; electrostatic charge; electrostatic comb drive; electrostatic field measurements; CMOS technology; Electrostatic discharge; Electrostatic measurements; Fabrication; Instruments; Microelectromechanical devices; Micromechanical devices; Nanofabrication; Pollution measurement; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
MEMS, NANO and Smart Systems, 2003. Proceedings. International Conference on
Print_ISBN :
0-7695-1947-4
Type :
conf
DOI :
10.1109/ICMENS.2003.1221967
Filename :
1221967
Link To Document :
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