DocumentCode :
1886265
Title :
ESR study of E´ trapping centers in SIMOX oxides
Author :
Conley, John F. ; Lenahan, P.M. ; Roitman, P.
Author_Institution :
Pennsylvania State Univ., University Park, PA, USA
fYear :
1991
fDate :
1-3 Oct 1991
Firstpage :
12
Lastpage :
13
Abstract :
The authors explore E´ trapping centers in separation by implanted oxygen (SIMOX) buried oxides with electron spin resonance (ESR) and capacitance vs. voltage (CV) measurements. Through the use of vacuum-ultraviolet (VUV) (10.2 eV) and ultraviolet (5 eV) illumination combined with ESR and CV measurements, they present evidence that E´ centers are important in SIMOX trapping and that thermal oxide trapping and SIMOX trapping involve different mechanisms. It is shown that E´ precursors are present in higher density in the SIMOX oxides explored than in thermal oxides. Large changes in E´ density are induced by injecting electrons or holes into VUV illuminated oxides; this shows that a high percentage of the centers are efficient traps. CV measurements show low amounts of net space charge; this suggests a compensating trap mechanism
Keywords :
defect electron energy states; electron traps; hole traps; ion implantation; paramagnetic resonance of defects; radiation effects; semiconductor-insulator boundaries; 10.2 eV; 5 eV; C-V characteristics; E´ trapping centers; ESR; SIMOX oxides; SIMOX trapping; Si-SiO2; UV illumination; buried oxides; compensating trap mechanism; electron injection; hole injection; net space charge; thermal oxide trapping; vacuum UV illumination; Capacitance; Charge carrier processes; Charge measurement; Current measurement; Density measurement; Electron traps; Lighting; Paramagnetic resonance; Space charge; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1991. Proceedings, 1991., IEEE International
Conference_Location :
Vail Valley, CO
Print_ISBN :
0-7803-0184-6
Type :
conf
DOI :
10.1109/SOI.1991.162832
Filename :
162832
Link To Document :
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