DocumentCode :
1886339
Title :
Managing overall equipment effectiveness [OEE] to optimize factory performance
Author :
Pomorski, Tom
Author_Institution :
Fairchild Semicond., South Portland, ME, USA
fYear :
1997
fDate :
6-8 Oct 1997
Abstract :
Overall equipment effectiveness (OEE) is the key metric of total productive manufacturing (TPM). OEE monitors the actual performance of a tool relative to its performance capabilities under optimal manufacturing conditions. OEE looks at the entire manufacturing environment measuring, not only the equipment availability, but also, the production efficiency while the equipment is available to run product, as well as the efficiency loss that results from scrap, rework, and yield losses. Analysis of the equipment effectiveness loss mechanisms provides the user with improvement opportunities for the operation. This paper focuses on the use of OEE and major equipment loss analysis to optimize the performance of constraint tools at Fairchild Semiconductor, South Portland, Maine. Factory modeling is a key element of the OEE management process, defining the equipment and process capabilities at the workstation (micro) level, then identifying constraint tools and OEE performance requirements through macro level factory capacity modeling. Also discussed in this paper, is the SEMI productivity metrics standard proposal which defines OEE and loss analysis methods which are consistent with SEMI E10-96 concepts
Keywords :
factory automation; integrated circuit manufacture; management; manufacturing resources planning; SEMI productivity metrics standard; constraint tools; efficiency loss; equipment availability; factory performance; macro level factory capacity modeling; optimal manufacturing conditions; overall equipment effectiveness management; production efficiency; rework; scrap; total productive manufacturing; yield losses; Availability; Constraint optimization; Loss measurement; Manufacturing; Performance analysis; Performance loss; Production facilities; Productivity; Proposals; Workstations;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
Type :
conf
DOI :
10.1109/ISSM.1997.664488
Filename :
664488
Link To Document :
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