• DocumentCode
    1887959
  • Title

    Fabrication of highly stable carbon nanotube electron beams(C-beam)

  • Author

    Jung Su Kang ; Su Woong Lee ; Ha Rim Lee ; Ji Hwan Hong ; Callixte, Shikili ; Min Tae Chung ; Kyu Chang Park

  • Author_Institution
    Dept. of Inf. Display, Kyung Hee Univ., Seoul, South Korea
  • fYear
    2015
  • fDate
    13-17 July 2015
  • Firstpage
    92
  • Lastpage
    93
  • Abstract
    We optimized the triode structure for carbon nanotube electron beam(C-beam) application with carbon nanotube emitters grown with resist-assisted pattering process. The CNT emitters grown through the RAP process have a structure in which a number of CNTs are congregated, and the graphitization post-treatment process proceeded in order to enhance their adhesive strength and stability. The gate mesh was self-aligned with the carbon nanotube island for lower leakage current, resulting higher electron emission current and transmission ratio. With the optimized triode structure, the emission current show high performance with less than 1 cm2 area and C-beams operated more than 500 hours with constant current mode and DC driving.
  • Keywords
    carbon nanotubes; electron beams; electron emission; graphitisation; leakage currents; triodes; C; C-beam; CNT emitters; DC driving; RAP process; adhesive strength; carbon nanotube electron beams; carbon nanotube emitters; carbon nanotube island; electron emission current; graphitization post-treatment process; leakage current; resist-assisted pattering process; triode structure; Anodes; Carbon nanotubes; Current measurement; Electron emission; Logic gates; Performance evaluation; Voltage measurement; CNT; Field emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2015 28th International
  • Conference_Location
    Guangzhou
  • Print_ISBN
    978-1-4673-9356-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2015.7225542
  • Filename
    7225542