DocumentCode
1887959
Title
Fabrication of highly stable carbon nanotube electron beams(C-beam)
Author
Jung Su Kang ; Su Woong Lee ; Ha Rim Lee ; Ji Hwan Hong ; Callixte, Shikili ; Min Tae Chung ; Kyu Chang Park
Author_Institution
Dept. of Inf. Display, Kyung Hee Univ., Seoul, South Korea
fYear
2015
fDate
13-17 July 2015
Firstpage
92
Lastpage
93
Abstract
We optimized the triode structure for carbon nanotube electron beam(C-beam) application with carbon nanotube emitters grown with resist-assisted pattering process. The CNT emitters grown through the RAP process have a structure in which a number of CNTs are congregated, and the graphitization post-treatment process proceeded in order to enhance their adhesive strength and stability. The gate mesh was self-aligned with the carbon nanotube island for lower leakage current, resulting higher electron emission current and transmission ratio. With the optimized triode structure, the emission current show high performance with less than 1 cm2 area and C-beams operated more than 500 hours with constant current mode and DC driving.
Keywords
carbon nanotubes; electron beams; electron emission; graphitisation; leakage currents; triodes; C; C-beam; CNT emitters; DC driving; RAP process; adhesive strength; carbon nanotube electron beams; carbon nanotube emitters; carbon nanotube island; electron emission current; graphitization post-treatment process; leakage current; resist-assisted pattering process; triode structure; Anodes; Carbon nanotubes; Current measurement; Electron emission; Logic gates; Performance evaluation; Voltage measurement; CNT; Field emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference (IVNC), 2015 28th International
Conference_Location
Guangzhou
Print_ISBN
978-1-4673-9356-0
Type
conf
DOI
10.1109/IVNC.2015.7225542
Filename
7225542
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